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Gigaphoton Inc patents


Recent patent applications related to Gigaphoton Inc. Gigaphoton Inc is listed as an Agent/Assignee. Note: Gigaphoton Inc may have other listings under different names/spellings. We're not affiliated with Gigaphoton Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "G" | Gigaphoton Inc-related inventors


Extreme ultraviolet light generating system

An extreme ultraviolet light generating system repetitively outputs extreme ultraviolet light emitted by a target that turns into plasma by being irradiated with a pulsed laser beam. The extreme ultraviolet light generating system may include: a target supply unit that sequentially supplies the target to a plasma generating region set within a chamber, an actuator connected to a laser beam focusing system that focuses the pulsed laser beam output from a laser apparatus that adjusts the focusing position of the pulsed laser beam, an extreme ultraviolet light generation controller that controls the extreme ultraviolet light generating system to output extreme ultraviolet light based on a burst pattern, and an actuator controller that controls the actuator to compensate for shifts of the focusing position of the pulsed laser beam during a burst operation by feedforward control.. ... Gigaphoton Inc

Narrow band excimer laser apparatus

A narrow band excimer laser apparatus includes a line narrowing module that narrows the spectral line width of laser light, a nitrogen gas introducing unit, a first valve that restricts the flow of nitrogen gas from the introducing unit into a casing of the module, an exhaust unit that causes gas to flow out from the casing, an exhaust pump for exhausting the gas from the casing, a second valve that restricts the exhausting of gas from the exhaust unit, an atmosphere discharge unit that discharges the gas within the casing into the atmosphere, a third valve that restricts the discharge of gas into the atmosphere, and a control unit that closes the second valve while opening the first and third valves, supplies nitrogen gas into the casing, then closes the third valve while opening the first and second valves, drives the exhaust pump, and causes laser oscillation thereafter.. . ... Gigaphoton Inc

Laser unit management system

A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.. ... Gigaphoton Inc

Solid-state laser system and excimer laser system

A solid-state laser system may include: a solid-state laser unit configured to output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength; a first solid-state amplifier configured to receive the first pulsed laser light, and output third pulsed laser light with the first wavelength; a wavelength converter configured to receive the third pulsed laser light, and output harmonic light with a third wavelength; a second solid-state amplifier configured to receive the second pulsed laser light, and output fourth pulsed laser light with the second wavelength; a raman laser unit configured to receive the fourth pulsed laser light, and output stokes light with a fourth wavelength; and a wavelength conversion system configured to receive the harmonic light and the stokes light, and output fifth pulsed laser light with a fifth wavelength converted in wavelength from the third wavelength and the fourth wavelength.. . ... Gigaphoton Inc

Laser system

The laser system includes a first laser apparatus, a second laser apparatus, a charging voltage measuring unit configured to measure the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, at least one bleeding circuit configured to reduce the charging voltage of the first storage capacitor and the charging voltage of the second storage capacitor, and a bleeding circuit controller configured to control the at least one bleeding circuit based on the voltage measured by the charging voltage measuring unit.. . ... Gigaphoton Inc

Laser gas purifying system

A laser gas purifying system is configured to purify emission gas emitted from an arf excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the arf excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.. ... Gigaphoton Inc

Extreme ultraviolet light generating apparatus

The extreme ultraviolet light generating apparatus may include a chamber having a window through which a pulse laser beam enters, a target supply unit configured to output at least one target toward a predetermined region in the chamber, a target image capturing device configured to capture an image of the at least one target, a first actuator configured to move a focused area focused by the target image capturing device, and a controller configured to control the first actuator based on a signal from an external device.. . ... Gigaphoton Inc

Extreme ultraviolet light generation device

An extreme ultraviolet light generation device may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target with laser light output by a laser device, in a generation region therein; a target supply unit configured to output the target as a droplet toward the generation region; a droplet detector configured to detect the droplet in a detection region; and a controller. The droplet detector may transmit, to the controller, a pass timing signal indicating a timing when the droplet passes through the detection region. ... Gigaphoton Inc

Extreme ultraviolet light generation device

An extreme ultraviolet light generation device may include a chamber in which a target is irradiated with laser light and extreme ultraviolet light is generated, and a target supply unit configured to eject a target into the chamber. The target supply unit may be provided with a nozzle member including an ejection face having an ejection port configured to eject the target into the chamber. ... Gigaphoton Inc

Target storage device

A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.. . ... Gigaphoton Inc

Extreme ultraviolet light generation apparatus

An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.. . ... Gigaphoton Inc

Laser chamber

A laser chamber may include a first discharge electrode, a second discharge electrode, a fan making a laser gas flow through a discharge space between the first and second discharge electrodes, a first insulating member disposed on upstream side and downstream side of the first discharge electrode in the laser gas flow, a first metal damper member disposed on upstream side of the second discharge electrode and a second insulating member disposed on downstream side of the second discharge electrode in the laser gas flow, and a second metal damper member disposed on downstream side of the second insulating member in the laser gas flow. In a boundary portion between the second metal damper member and the second insulating member, a first discharge space side surface of the second metal damper member may be located further toward the opposite side to the discharge space than a second discharge space side surface of the second insulating member. ... Gigaphoton Inc

Line narrowed laser apparatus

. . The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. ... Gigaphoton Inc

Device for controlling temperature of cooling water

A device for controlling the temperature of cooling water includes a three-way valve having a first inlet, a second inlet, and an outlet; a first feed pipe; a second feed pipe; and a return pipe for connecting between an outlet of the temperature-control target and an inlet of the cooling water supply unit. The device also includes a return-side bypass pipe for connecting between the return pipe and the second inlet of the three-way valve; a pump provided on the second feed pipe for circulating the cooling water between the three-way valve and the temperature-control target; and a temperature measuring unit for measuring a temperature of the cooling water flowing in the second feed pipe. ... Gigaphoton Inc

04/19/18 / #20180110116

System and method for generating extreme ultraviolet light

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.. . ... Gigaphoton Inc

04/19/18 / #20180109065

Amplifier and laser system

An amplifier may include a chamber, and first and second mirrors. The chamber may include a pair of discharge electrodes opposed to each other in a first direction, a laser exciting medium, an input window allowing seed light to pass therethrough into the chamber, and an output window allowing amplified laser light to pass therethrough to outside in a second direction intersecting with the first direction. ... Gigaphoton Inc

04/12/18 / #20180103534

Extreme ultraviolet light generation device

The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.. . ... Gigaphoton Inc

04/12/18 / #20180102622

Excimer laser device

The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.. ... Gigaphoton Inc

03/15/18 / #20180077785

Extreme ultraviolet light generation device

Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.. ... Gigaphoton Inc

02/22/18 / #20180052059

Light beam measurement device, laser apparatus, and light beam separator

A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing caf2.. . ... Gigaphoton Inc

02/15/18 / #20180048109

Excimer laser apparatus and excimer laser system

The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.. . ... Gigaphoton Inc

02/08/18 / #20180041000

Laser device and line narrow optics

A laser device may include a chamber accommodating a pair of discharge electrodes, a grating provided outside the chamber, first beam-expanding optics provided between the chamber and the grating and configured to expand a beam width of light outputted from the chamber at least in a first direction perpendicular to a direction of discharge between the pair of discharge electrodes, and second beam-expanding optics having a plurality of prisms provided between the chamber and the grating, the second beam-expanding optics being configured to expand a beam width of light outputted from the chamber at least in a second direction parallel to the direction of discharge between the pair of discharge electrodes.. . ... Gigaphoton Inc

01/25/18 / #20180026414

Laser unit and non-transitory computer-readable storage medium

There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.. . ... Gigaphoton Inc

01/18/18 / #20180019141

Laser system and laser annealing apparatus

A laser system may serve as a light source of a laser annealing apparatus that irradiates a workpiece with a pulse laser beam. The laser system may include: a laser apparatus configured to generate the pulse laser beam; a time-domain pulse waveform changing apparatus configured to change time-domain pulse waveform of the pulse laser beam; and a controller configured to receive at least one parameter for generating the time-domain pulse waveform from the laser annealing apparatus and to control the time-domain pulse waveform changing apparatus.. ... Gigaphoton Inc

01/11/18 / #20180013258

Laser system

The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. ... Gigaphoton Inc

01/04/18 / #20180007771

Droplet detector and extreme ultraviolet light generating apparatus

The stability of operations of an euv light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.. ... Gigaphoton Inc

01/04/18 / #20180007770

Chamber device, target generation method, and extreme ultraviolet light generation system

A chamber device may include a chamber, and a target generation device assembled into the chamber and configured to supply a target material into the chamber, the target generation device including a tank configured to store the target material, a temperature variable device configured to vary temperature of the target material in the tank, and a nozzle section in which a nozzle hole configured to output the target material in a liquid form is formed, and the chamber device may further include a gas nozzle having an inlet port facing the nozzle section and configured to introduce gas into the chamber, a gas supply source configured to supply gas containing hydrogen to the gas nozzle to supply the gas containing the hydrogen to at least periphery of the nozzle section, and a moisture remover configured to remove moisture at least in the periphery of the nozzle section in the chamber.. . ... Gigaphoton Inc

12/28/17 / #20170373461

Laser apparatus and measurement unit

A laser apparatus may include: a quantum cascade laser outputting, based on a supplied current, laser light at an oscillation start timing when a first delay time elapses from a current rising timing of the supplied current: an amplifier disposed in a laser light optical path, and selectively amplifying light of a predetermined wavelength to output the amplified laser light to a chamber including a plasma generation region into which a target is fed; and a laser controller controlling a third delay time, from an output timing of a laser output instruction to the current rising timing, to cause a laser light wavelength to be equal to the predetermined wavelength at an aimed timing when a second delay time elapses from the oscillation start timing, based on oscillation parameters including the first delay time, a supplied current waveform, and a device temperature of the quantum cascade laser.. . ... Gigaphoton Inc

12/21/17 / #20170365475

Laser doping apparatus and laser doping method

The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.. ... Gigaphoton Inc

12/14/17 / #20170358442

Target image-capture device, extreme-ultraviolet-light generation device, and extreme-ultraviolet-light generation system

A target image-capture device may be configured to capture an image of a target that is made into plasma when irradiated with laser light and generates extreme-ultraviolet-light. The target image-capture device may include a droplet detector configured to detect passage of a droplet output as the target, and output a detection signal, an illumination light source, an image capturing element, a shutter device, and a controller configured to output, to the image capturing element, an exposure signal allowing the image capturing element to perform image capturing, and output, to the shutter device, a shutter open/close signal allowing a shutter to perform an open and close operation upon input of the detection signal. ... Gigaphoton Inc

11/30/17 / #20170346252

Excimer laser chamber device

An excimer laser chamber device may include: a the laser chamber; a first electrode provided in the laser chamber; a second electrode provided in the laser chamber to face the first electrode; an electrode holder provided in the laser chamber to be connected to a high voltage; at least one connecting terminal including a first anchored portion anchored to the first electrode and a second anchored portion anchored to the electrode holder, the at least one connecting terminal being configured to electrically connect the first electrode and the electrode holder; a guide member held by the electrode holder, the guide member being configured to position the first electrode in a direction substantially perpendicular to both a direction of electric discharge between the first electrode and the second electrode and a longitudinal direction of the first electrode; and an electrode-gap-varying unit configured to move the first electrode in a direction substantially parallel to the direction of electric discharge.. . ... Gigaphoton Inc

11/23/17 / #20170338620

Laser device

A laser device may include: a master oscillator including a first laser chamber, a first pair of discharge electrodes provided in the first laser chamber, and an optical resonator, the master oscillator being configured to output a laser beam; a first amplifier including a second laser chamber provided in an optical path of the laser beam outputted from the master oscillator and a second pair of discharge electrodes provided in the second laser chamber at a first gap distance, the first amplifier being configured to amplify the laser beam; and a first beam-adjusting optical system provided in an optical path of the laser beam between the master oscillator and the first amplifier, the first beam-adjusting optical system being configured to adjust the laser beam outputted from the master oscillator such that a beam width of the laser beam entering the first amplifier measured in a direction of electric discharge between the second pair of discharge electrodes is substantially equal to the first gap distance between the second pair of discharge electrodes.. . ... Gigaphoton Inc

11/23/17 / #20170338619

Solid-state laser system and laser apparatus used for exposure apparatus

A solid-state laser system may include a first solid-state laser unit, a second solid-state laser unit, a wavelength conversion system, a wavelength detector, and a wavelength controller. The wavelength conversion system may receive a first pulsed laser light beam with a first wavelength and a second pulsed laser light beam with a second wavelength, and output a third pulsed laser light beam with a third wavelength converted from the first and second wavelengths. ... Gigaphoton Inc

11/23/17 / #20170338618

High-voltage pulse generator and gas laser apparatus

A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. ... Gigaphoton Inc

11/23/17 / #20170338617

Solid-state laser apparatus, fiber amplifier system, and solid-state laser system

A solid-state laser apparatus may include a first oscillator, a laser light generator, and a plurality of stages of fiber amplifiers. The first oscillator may be configured to output seed light. ... Gigaphoton Inc

11/23/17 / #20170338616

Discharge excitation gas laser apparatus

A discharge excitation gas laser device may include a laser chamber in which a laser gas containing a halogen gas is encapsulated, a pair of discharge electrodes disposed to face each other inside the laser chamber, a fan disposed inside the laser chamber to make the laser gas flow between the pair of discharge electrodes, a motor for rotating the fan, a motor power supply for supplying power to the motor, a magnetic bearing configured to levitate the rotary shaft of the fan magnetically, a displacement sensor for detecting the position of the rotary shaft through a can, and a controller configured to measure the rotational speed of the fan on the basis of a detection signal from the displacement sensor and control the motor power supply in such a manner that the measured rotational speed becomes a target rotational speed.. . ... Gigaphoton Inc

11/23/17 / #20170338033

Pulse power module

To reduce the size of a magnetic circuit to be provided in a pulse power module for applying a high voltage in the form of a pulse across a pair of discharge electrodes which are disposed in a laser chamber of a gas laser apparatus, the magnetic circuit may include a magnetic core, an insulation member configured to contain a refrigerant flow path therein and cover the periphery of the magnetic core, and a winding wound around the insulation member.. . ... Gigaphoton Inc

11/23/17 / #20170336282

Spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light

A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. ... Gigaphoton Inc

10/26/17 / #20170307979

Extreme uv light generation device and target recovery apparatus

An euv light generation device generates euv light stably. The euv light generation device may include a chamber in which extreme ultraviolet light is generated when a target is irradiated with laser light in a predetermined region inside the chamber, a target supply device configured to output the target to the predetermined region in the chamber to thereby supply the target to the predetermined region, and a target recovery apparatus configured to recover the target output from the target supply device and not irradiated with the laser light. ... Gigaphoton Inc

10/05/17 / #20170288361

Gas laser apparatus

A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.. . ... Gigaphoton Inc

09/28/17 / #20170280545

Extreme ultraviolet light generating system, extreme ultraviolet light generating method, and thomson scattering measurement system

An extreme ultraviolet light generating system may include: a chamber; a target feeding unit configured to feed a target into the chamber; a drive laser unit configured to irradiate the target with a drive pulsed laser light beam to generate a plasma to thereby generate extreme ultraviolet light; a probe laser unit configured to irradiate the plasma with a probe pulsed laser light beam to thereby generate thomson scattered light; a spectrometer configured to measure a spectrum waveform of an ionic term in the thomson scattered light; and a wavelength filter disposed upstream of the spectrometer, and configured to suppress light with a predetermined wavelength from entering the spectrometer. The light with the predetermined wavelength may be part of light containing the thomson scattered light, and the predetermined wavelength may be substantially same as a wavelength of the probe pulsed laser light beam.. ... Gigaphoton Inc

09/28/17 / #20170280544

Beam delivery system and control method therefor

A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.. ... Gigaphoton Inc

09/28/17 / #20170280543

Target supply device, processing device and processing method thefefor

A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.. . ... Gigaphoton Inc

09/28/17 / #20170279241

Solid-state laser system

A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. ... Gigaphoton Inc

08/31/17 / #20170250517

Extreme ultraviolet light generating apparatus

A beam adjusting apparatus of an extreme ultraviolet light generating apparatus may include: a first pair of mirrors constituted by a first concave mirror and a first convex mirror, provided along the optical path of the pulsed laser beam; a second pair of mirrors constituted by a second concave mirror and a second convex mirror, which are arranged in an order reversed from the order of arrangement of the first concave mirror and the first convex mirror, provided along the optical path of the pulsed laser beam downstream from the first pair of mirrors; and a moving apparatus configured to simultaneously increase or simultaneously decrease the distance between the first concave mirror and the first convex mirror and the distance between the second concave mirror and the second convex mirror.. . ... Gigaphoton Inc

08/31/17 / #20170248782

Laser irradiation device

A laser irradiation device may include: a laser device configured to emit a pulse laser beam; beam scan optics configured to allocate the pulse laser beam emitted from the laser device to optical paths; beam homogenizers provided in the respective optical paths, each of the beam homogenizers being configured to homogenize distribution of light intensity of the pulse laser beam allocated to a corresponding optical path of the optical paths; and a controller configured to control the beam scan optics to allocate, for each pulse, the pulse laser beam emitted from the laser device to the corresponding optical path of the optical paths.. . ... Gigaphoton Inc

08/31/17 / #20170248758

Grating, method for manufacturing grating, and method for recycling grating

A grating for line-narrowing a laser beam that is outputted from a laser apparatus at a wavelength in a vacuum ultraviolet region may include: a grating substrate; a first aluminum metal film formed above the grating substrate, the first aluminum metal film having grooves in a surface thereof; and a first protective film formed by an ald method above the first aluminum metal film.. . ... Gigaphoton Inc

08/24/17 / #20170244215

Titanium-sapphire laser apparatus, laser apparatus used for exposure apparatus, and titanium-sapphire amplifier

A titanium-sapphire laser apparatus may include a continuous wave oscillation laser unit, an amplification oscillator, a pulsed laser unit, an error detector, an error controller, and an optical path length corrector. The amplification oscillator may include an optical resonator and a titanium-sapphire crystal that is provided in an optical path in the optical resonator. ... Gigaphoton Inc

08/17/17 / #20170238407

Extreme ultraviolet light generation device

An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.. . ... Gigaphoton Inc

08/10/17 / #20170231075

Extreme ultraviolet light generation device

An extreme ultraviolet light generation device may include: a chamber earthed to a ground, in which extreme ultraviolet light is generated by irradiating a metal target supplied inside with laser light; a target supply unit earthed to the ground and configured to output the target supplied into the chamber from a nozzle; an extraction electrode configured to exert electrostatic force on the target by applying a negative first potential to the extraction electrode; a first power supply configured to apply the first potential to the extraction electrode; an acceleration electrode unit configured to accelerate the target by applying a negative second potential lower than the first potential to the acceleration electrode unit; a second power supply configured to apply the second potential to the acceleration electrode unit; and a charge neutralizer disposed inside the acceleration electrode unit and configured to emit electrons onto the target.. . ... Gigaphoton Inc

08/03/17 / #20170222391

Narrow band laser apparatus

A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.. ... Gigaphoton Inc

07/27/17 / #20170215267

Extreme ultraviolet light generation apparatus

An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.. ... Gigaphoton Inc

07/27/17 / #20170215266

Vibrator unit and target supply device

A vibrator unit may be configured to apply vibration to a target material supplied to an inside of a target flow path. The vibrator unit may include a vibration transmission member to be brought into contact with a first member including the target flow path therein, and a piezoelectric member to be brought into contact with the vibration transmission member. ... Gigaphoton Inc

07/27/17 / #20170209899

Vibrator unit and target supply device

A vibrator unit may be configured to vibrate a target material in a target channel and include a vibration element configured to vibrate in response to an external electrical signal having a predetermined frequency. A resonance frequency of the vibration element may be different from the predetermined frequency of the electrical signal. ... Gigaphoton Inc

07/20/17 / #20170205713

Extreme ultraviolet light generating apparatus and method for generating extreme ultraviolet light

An extreme ultraviolet light generating apparatus may include: a chamber, in which extreme ultraviolet light is generated; a target supply unit that outputs a target into the chamber as droplets to supply the target to a plasma generating region; a stage that moves the target supply unit in a direction substantially perpendicular to the trajectory of droplets output from the target supply unit; a droplet detector provided between the target supply unit and the plasma generating region at an inclination of a predetermined angle with respect to a substantially vertical direction, that detects the droplets from a direction inclined at the predetermined angle; and a calculation control unit that controls the irradiation timings of the laser beam at which the laser beam is irradiated onto the droplets within the plasm generating region, by adding delay times to the timings at which the droplets are detected by the droplet detector.. . ... Gigaphoton Inc

07/20/17 / #20170205631

Narrow band laser apparatus and method for positioning line narrow module

A narrow band laser apparatus may include: a laser chamber; a line narrow module configured to narrow a band width of a laser beam outputted from the laser chamber and return the laser beam to the laser chamber, the line narrow module including a grating; a housing accommodating the line narrow module; three mounts fixed to the housing; and a housing moving device configured to support the housing and the line narrow module by supporting each of the three mounts and move the line narrow module by moving the housing with respect to the laser chamber in a direction substantially perpendicular to a dispersion plane of the grating.. . ... Gigaphoton Inc

07/20/17 / #20170203238

Target generation device, and method for manufacturing filter structure

A target generation device may include a filter structure, a flange, a tank unit, and a nozzle section. The flange may accommodate the filter structure and contain a flow path passing through the filter structure. ... Gigaphoton Inc

07/06/17 / #20170196072

Laser apparatus for generating extreme ultraviolet light

A system for generating extreme ultraviolet light, in which a target material inside a chamber is irradiated with a laser beam to be turned into plasma, includes a first laser apparatus configured to output a first laser beam, a second laser apparatus configured to output a pedestal and a second laser beam, and a controller connected to the first and second laser apparatuses and configured to cause the first laser beam to be outputted first, the pedestal to be outputted after the first laser beam, and the second laser beam having higher energy than the pedestal to be outputted after the pedestal.. . ... Gigaphoton Inc

06/22/17 / #20170181259

Laser apparatus and extreme ultraviolet light generating apparatus

A laser beam having desired properties is output at desired timings. A laser apparatus is a laser apparatus for use with an extreme ultraviolet light generating apparatus that generates extreme ultraviolet light at a repetition frequency which is set in advance, and may be equipped with: a semiconductor laser that outputs a laser beam when a trigger signal is input thereto; an optical switch that switches between a state in which the laser beam passes therethrough and a state in which the laser beam does not pass therethrough, provided along the optical path of the laser beam; and a control unit configured to output the trigger signal to the semiconductor laser at a frequency which is an integer multiple of the repetition frequency, and to control the optical switch such that the laser beam passes therethrough at the repetition frequency.. ... Gigaphoton Inc

06/15/17 / #20170171955

Extreme ultraviolet light generation system and method of generating extreme ultraviolet light

An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. ... Gigaphoton Inc

05/04/17 / #20170127505

Extreme ultraviolet light generation system and extreme ultraviolet light generation method

An extreme ultraviolet light generation system may comprise a chamber, a target supply unit configured to supply, to a predetermined region in the chamber, a target having an atomic density of 8.0×1017 atoms/cm3 or higher and 1.3×1018 atoms/cm3 or lower, and a laser apparatus configured to irradiate the predetermined region with a pulse laser beam having an energy density of 10.5 j/cm2 or higher and 52.3 j/cm2 or lower in the predetermined region.. . ... Gigaphoton Inc

04/13/17 / #20170103895

Laser irradiation apparatus and laser irradiation method

A laser irradiation apparatus may include a plasma generator, a laser unit configured to output a pulsed laser light beam, and a controller. The plasma generator may be configured to supply an atmospheric pressure plasma containing a dopant to a predetermined region on a semiconductor material. ... Gigaphoton Inc

03/30/17 / #20170094767

Extreme ultraviolet light generation device

An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.. ... Gigaphoton Inc

03/30/17 / #20170093119

Laser system

A laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled laser beam, and a controller configured to control operated laser apparatuses of the plurality of laser apparatuses such that, at a change in a number representing how many laser apparatuses are operated, a beam parameter of the bundled laser beam emitted from the beam delivery device approaches a beam parameter of the bundled laser beam emitted before the change.. . ... Gigaphoton Inc

03/16/17 / #20170079126

Extreme ultraviolet light generation apparatus

A target sensor may include: a plurality of sensor elements, each of the plurality of sensor elements being configured to output a sensor signal that varies in accordance with an amount of light received on a light-receiving surface; and a signal generator configured to process the sensor signals from the plurality of sensor elements. The light-receiving surfaces of the plurality of sensor elements may be disposed at different positions in a second direction different from a first direction along which an image of the target illuminated by the illumination light may move. ... Gigaphoton Inc

03/09/17 / #20170070024

Laser apparatus, euv light generation system, and method of controlling laser apparatus

A laser apparatus may include: an optical amplifier configured to amplify a laser beam outputted from a master oscillator; an optical-amplifier power supply configured to supply an alternating current for optical amplification to the optical amplifier; and a laser controller. The optical-amplifier power supply may include: an alternating current generation circuit including an inverter circuit configured to change output amplitude in accordance with a duty cycle, the alternating current generation circuit being configured to generate the alternating current from an output of the inverter circuit; and a power supply control circuit configured to hold control information defining correspondence relations between command values from the laser controller and duty cycles of the inverter circuit, determine a duty cycle corresponding to a command value received from the laser controller based on the control information, and provide the determined duty cycle to the inverter circuit.. ... Gigaphoton Inc

03/09/17 / #20170070023

Laser system

The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. ... Gigaphoton Inc

03/02/17 / #20170064800

Extreme ultraviolet light generation apparatus

An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.. . ... Gigaphoton Inc

03/02/17 / #20170064799

Extreme uv light generator

An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target supplied into the chamber with a laser beam; a target generator that supplies the target into the chamber as a droplet; a droplet measurement unit that measures the droplet supplied from the target generator into the chamber; and a shielding member that shields the droplet measurement unit from electromagnetic waves emitted from the plasma, the droplet measurement unit including: a light source that emits continuous light to the droplet; a window provided in the chamber to allow the continuous light to transmit therethrough; and an optical sensor that receives the continuous light via the window. The shielding member includes a shielding body provided on the chamber side with respect to the window and configured to cover an optical path of the continuous light.. ... Gigaphoton Inc

03/02/17 / #20170063025

Laser system

The laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled pulse laser beam, and a beam parameter measuring device provided in an optical path of the bundled pulse laser beam to measure a beam parameter of each one of the pulse laser beams and a beam parameter of the bundled pulse laser beam.. . ... Gigaphoton Inc

03/02/17 / #20170063024

Laser system

The laser system may include a first laser apparatus configured to emit a first pulse laser beam, a second laser apparatus configured to emit a second pulse laser beam, a timing detector, and a controller. The timing detector may be configured to detect a first passage timing at which the first pulse laser beam passes a first position and a second passage timing at which the second pulse laser beam passes a second position. ... Gigaphoton Inc

03/02/17 / #20170063020

System and method for generating extreme ultraviolet light, and laser apparatus

An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.. . ... Gigaphoton Inc

02/23/17 / #20170055336

Extreme ultraviolet light generation apparatus

An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.. . ... Gigaphoton Inc

02/23/17 / #20170053780

Target supply device, target material refining method, recording medium having target material refining program recorded therein, and target generator

A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.. . ... Gigaphoton Inc

02/02/17 / #20170033527

Gas laser device and condenser

A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.. . ... Gigaphoton Inc

01/26/17 / #20170027047

Extreme ultraviolet light generation system

An extreme ultraviolet light (euv) generation system is configured to improve conversion efficiency of energy of a laser system to euv energy by improving the efficiency of plasma generation. The euv generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. ... Gigaphoton Inc

01/19/17 / #20170019983

System and method for generating extreme ultraviolet light

A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.. . ... Gigaphoton Inc








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