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Hermes Microvision Inc patents


Recent patent applications related to Hermes Microvision Inc. Hermes Microvision Inc is listed as an Agent/Assignee. Note: Hermes Microvision Inc may have other listings under different names/spellings. We're not affiliated with Hermes Microvision Inc, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "H" | Hermes Microvision Inc-related inventors


Load lock system for charged particle beam imaging

A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. ... Hermes Microvision Inc

Method and machine for examining wafers

Method and machine utilizes the real-time recipe to perform weak point inspection on a series of wafers during the fabrication of integrated circuits. Each real-time recipe essentially corresponds to a practical fabrication history of a wafer to be examined and/or the examination results of at least one examined wafer of same “lot”. ... Hermes Microvision Inc

Apparatus of plural charged-particle beams

A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. ... Hermes Microvision Inc

Apparatus of plural charged-particle beams

A new multi-beam apparatus with a total fov variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. ... Hermes Microvision Inc

Test device for defect inspection

A structure, for defect inspection, is provided, which includes a scanning pad scanned by an electron beam inspection tool and a test key. The structure can be located in the scribe line. ... Hermes Microvision Inc

Apparatus of plural charged-particle beams

A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. ... Hermes Microvision Inc

Apparatus of plural charged-particle beams

A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. ... Hermes Microvision Inc

Apparatus of plural charged-particle beams

One modified source-conversion unit and one method to reduce the coulomb effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. ... Hermes Microvision Inc

Charged particle source

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. ... Hermes Microvision Inc

Charged particle source

This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. ... Hermes Microvision Inc

Charged particle source

This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. ... Hermes Microvision Inc

Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet mask

A structure for discharging an extreme ultraviolet mask (euv mask) is provided to discharge the euv mask during the inspection by an electron beam inspection tool. The structure for discharging an euv mask includes at least one grounding pin to contact conductive areas on the euv mask, wherein the euv mask may have further conductive layer on sidewalls or/and bottom. ... Hermes Microvision Inc

Method and system for inspecting an euv mask

A structure for grounding an extreme ultraviolet mask (euv mask) is provided to discharge the euv mask during the inspection by an electron beam inspection tool. The structure for grounding an euv mask includes at least one grounding pin to contact conductive areas on the euv mask, wherein the euv mask may have further conductive layer on sidewalls or/and back side. ... Hermes Microvision Inc

Apparatus of plural charged-particle beams

A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. ... Hermes Microvision Inc

01/26/17 / #20170025241

Apparatus of plural charged-particle beams

A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong coulomb effect due to the primary-electron beam.. ... Hermes Microvision Inc








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