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Jsr Corporation patents


Recent patent applications related to Jsr Corporation. Jsr Corporation is listed as an Agent/Assignee. Note: Jsr Corporation may have other listings under different names/spellings. We're not affiliated with Jsr Corporation, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "J" | Jsr Corporation-related inventors


Forming method of contact hole pattern

A contact hole pattern-forming method includes forming a hole pattern on a front face side of a substrate, directly or via other layer. A first composition including a first polymer is applied circularly in a planar view so as to coat lateral faces of holes of the hole pattern. ... Jsr Corporation

Method for producing soldered electrode and use thereof

The present disclosure relates to a production process for a solder electrode, including a step (1) of forming a coating film of a photosensitive resin composition on a substrate having an electrode pad; a step (2) of forming resist having an opening in a region corresponding to the electrode pad by selectively exposing the coating film to light and further developing the film; a step (3) of heating and/or exposing the resist to light; and a step (4) of filling the opening with molten solder while heating the solder. According to the production process for the solder electrode of the present disclosure, development of cracks on a resist surface can be prevented, and solder filling capability can be improved, even when the resist receives high heat during solder filling as in an ims method, and therefore the solder electrode adapted for the purpose can be appropriately produced.. ... Jsr Corporation

Indium phosphide smoothing and chemical mechanical planarization processes

A chemical mechanical planarization for indium phosphide material is provided in which at least one opening is formed within a dielectric layer located on a substrate. An indium phosphide material is epitaxially grown within the at least one opening of the dielectric layer which extends above a topmost surface of the dielectric layer. ... Jsr Corporation

Production process for solder electrode and use thereof

The present invention relates to a production process for a solder electrode, including: a step (1) of forming a coating film of a photosensitive resin composition on a substrate having an electrode pad; a step (2) of forming resist having an opening in a region corresponding to the electrode pad by selectively exposing the coating film to light and further developing the film; and a step (3) of filling the opening with molten solder, in which the photosensitive resin composition contains at least a benzoxazole precursor. According to the production process for the solder electrode of the present invention, development of cracks on a resist surface can be prevented, and solder filling capability can be improved, even when the resist receives high heat during solder filling as in an ims method, and therefore the solder electrode adapted for the purpose can be appropriately produced.. ... Jsr Corporation

Method for producing three-dimensional object

A method for producing a three-dimensional (3d) object having excellent moldability and mechanical characteristics is provided. The method includes a molding step of irradiating a composition filled in the cavity of a mold with electromagnetic waves having a wavelength of from 0.01 m to 100 m, and molding the composition into the 3d object. ... Jsr Corporation

Immunoglobulin-binding protein and affinity carrier using same

Provided is an affinity chromatography carrier that maintains high immunoglobulin-binding capacity and high alkali resistance. An immunoglobulin-binding protein including at least one modified immunoglobulin-binding domain, the modified immunoglobulin-binding domain being a polypeptide consisting of an amino acid sequence of an immunoglobulin-binding domain selected from the group consisting of the b domain, z domain, c domain, and variants thereof of staphylococcus aureus protein a, in which at least one amino acid residue is inserted between positions corresponding to the 3-position and position 4 of the amino acid sequence of the b domain, z domain or c domain.. ... Jsr Corporation

Liquid crystal element and method of producing the same

A liquid crystal element includes a pair of substrates disposed to face each other, a liquid crystal layer disposed between the pair of substrates, and a liquid crystal alignment layer provided on each of the liquid crystal layer sides of the pair of substrates. The liquid crystal layer includes a compound having an alkenyl structure and a compound having a terphenyl ring structure, or includes a compound having an alkenyl structure and a terphenyl ring structure in the same molecule, and the liquid crystal alignment layer is a layer comprising a liquid crystal alignment agent containing a polymer (p) which has at least one selected from the group consisting of a radical polymerizable group, a photoinitiator group, a nitrogen-containing heterocyclic ring (excluding imide rings in polyimides), an amino group and a protected amino group.. ... Jsr Corporation

Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning method

A treatment composition for chemical mechanical polishing includes: (a) a water-soluble amine; (b) a water-soluble polymer having an aromatic hydrocarbon group-containing repeating unit; and an aqueous medium. The treatment composition for chemical mechanical polishing preferably further includes (c) an organic acid having an aromatic hydrocarbon group and has a ph of 9 or more.. ... Jsr Corporation

Treatment agent for inhibiting substrate pattern collapse and treatment method of substrate

A treatment agent for inhibiting substrate pattern collapse contains a polymer and a polar solvent. A treatment method of a substrate includes: applying the treatment agent onto a substrate having a pattern formed thereon; and drying the treatment agent applied onto the substrate. ... Jsr Corporation

Copolymer, polymer composition, and crosslinked polymer

A copolymer having a structural unit derived from a conjugated diene compound and a structural unit derived from an α-olefin having 3 to 8 carbon atoms, wherein the copolymer has a melting point within a temperature range of 0 to 10° c. And has a fusion enthalpy of 5 j/g or more as measured on a differential scanning calorimeter under the following conditions. ... Jsr Corporation

Modified conjugated diene polymer, method for producing modified conjugated diene polymer, polymer composition, crosslinked polymer, and tire

A modified conjugated diene-based polymer is produced by reacting a conjugated diene-based polymer having an alkali metal or an alkali-earth metal at a terminal of the polymer with a compound represented by formula (1). R1 and r2 independently represent a hydrocarbyl group having 20 or fewer carbon atoms. ... Jsr Corporation

Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrate

A resist underlayer film-forming composition includes a solvent, and a compound comprising an aromatic ring. The solvent includes a first solvent having a normal boiling point of less than 156° c., and a second solvent having a normal boiling point of no less than 156° c. ... Jsr Corporation

Optical filter and ambient light sensor including optical filter

An optical filter including a base member having a layer containing near-infrared absorbing fine particles and a dielectric multilayer film, the optical filter satisfying a requirement that, in a wavelength range of 400 nm to 650 nm, an average of transmittance of any of light incident from a direction perpendicular to the optical filter, light obliquely incident at an angle of 30 degrees, and light obliquely incident at an angle of 60 degrees is 45% or higher and lower than 85%; and a requirement that, in a wavelength range of 800 nm to 1,200 nm, an average of optical density (od value) of any of light incident from the direction perpendicular to the optical filter, light obliquely incident at an angle of 30 degrees with respect to the perpendicular direction, and light obliquely incident at an angle of 60 degrees with respect to the perpendicular direction is 1.7 or higher.. . ... Jsr Corporation

Polymer, resin composition and resin molded product

The polymer includes a first structural unit represented by formula (1), a second structural unit represented by formula (2), and a third structural unit represented by formula (3). R1, r2, r10 and r11 each independently represent a halogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a monovalent halogenated hydrocarbon group having 1 to 20 carbon atoms, a nitro group or a cyano group; r3a, r3b r4a and r4b each independently represent a methylene group or an alkylene group having 2 to 4 carbon atoms; za to zd each independently represent —o— or —s—; and l represents a divalent group represented by formula (3-1) or (3-2), wherein ra represents a divalent alicyclic hydrocarbon group having 5 to 30 ring atoms or a divalent fluorinated alicyclic hydrocarbon group having 5 to 30 ring atoms.. ... Jsr Corporation

12/28/17 / #20170369649

Polymer, resin composition and resin molded product

A polymer includes a first structural unit represented by formula (1-1), (1-2) or (1-3) and a second structural unit represented by formula (2) or (3). In the formulae (1-1) to (1-3), (2) and (3), r1, r10 and r11 each represent a halogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a monovalent halogenated hydrocarbon group having 1 to 20 carbon atoms, a nitro group or a cyano group; zs each represent —o— or —s—; r4s each represent a methylene group or an alkylene group having 2 to 4 carbon atoms; and l represents a divalent group represented by formula (2-1). ... Jsr Corporation

12/07/17 / #20170351174

Pattern-forming method and composition

. . A pattern-forming method includes forming a base pattern including a first polymer on a front face side. A composition is applied on at least a lateral face of the base pattern. ... Jsr Corporation

11/16/17 / #20170330763

Semiconductor treatment composition and treatment method

. . A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per ml.. . ... Jsr Corporation

11/16/17 / #20170330762

Semiconductor treatment composition and treatment method

A semiconductor treatment composition includes potassium and sodium, and has a potassium content mk (ppm) and a sodium content mna (ppm) that satisfy mk/mna=5×103 to 1×105.. . ... Jsr Corporation

11/16/17 / #20170329228

Resist pattern-forming method

A resist pattern-forming method includes applying a photoresist composition directly or indirectly on a front face of a substrate to form a photoresist film. A topcoat layer is laminated directly or indirectly on a front face of the photoresist film. ... Jsr Corporation

11/09/17 / #20170322492

Resist pattern-forming method

A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (a) a polysiloxane. ... Jsr Corporation

09/28/17 / #20170279123

Binder composition for storage device electrode, slurry for storage device electrode, storage device electrode, and storage device

. . . . An electrical storage device electrode binder composition exhibits an excellent binding capability, and makes it possible to produce an electrical storage device electrode that exhibits excellent charge-discharge durability characteristics. The electrical storage device electrode binder composition includes a polymer (a) and a liquid medium (b), wherein the polymer (a) is polymer particles, and the ratio (da/db) of the average particle size (da) of the polymer particles measured by using a dynamic light scattering method to the average particle size (db) of the polymer particles measured by tem observation is 2 to 10.. ... Jsr Corporation

09/21/17 / #20170269476

Photoresist composition, production method of photoresist composition, and resist pattern-forming method

A photoresist composition includes a radiation-sensitive acid generator, particles, and a first solvent. The radiation-sensitive acid generator is capable of generating an acid upon irradiation with a radioactive ray, an action of the acid allowing a solubility of a film made from the photoresist composition in a developer solution to be altered. ... Jsr Corporation

09/07/17 / #20170255096

Pattern-forming method

A pattern-forming method enables a resist pattern having a favorable shape with a desired size to be conveniently formed while generation of defects is inhibited, and by using such a superior resist pattern as a mask, a pattern having a favorable shape and arrangement can be formed. The pattern-forming method including: overlaying a base pattern on a front face side of a substrate directly or via other layer; applying a first composition on at least a lateral face of the base pattern; forming a polymer layer by graft polymerization on a surface of the coating film formed after the applying; and etching the substrate by one or a plurality of etching operations by using a resist pattern that includes the base pattern, the coating film and the polymer layer.. ... Jsr Corporation

08/24/17 / #20170243980

Thin film transistor and mos field effect transistor that include hydrophilic/hydrophobic material, and methods for manufacturing the same

. . The thin film transistor includes a first insulating layer provided on a substrate; a source electrode and a drain electrode that are provided on the first insulating layer; a semiconductor layer provided so as to cover the first insulating layer, the source electrode, and the drain electrode; a second insulating layer provided on the semiconductor layer; and a gate electrode provided on the second insulating layer, in which the first insulating layer is formed of a hydrophilic/hydrophobic material and has a recess portion, and the source electrode and the drain electrode are provided so as to fill the recess portion of the first insulating layer.. . ... Jsr Corporation

08/24/17 / #20170242336

Radiation-sensitive composition and pattern-forming method

A radiation-sensitive composition includes particles including a metal oxide as a principal component, a radiation-sensitive acid generator, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. ... Jsr Corporation

08/24/17 / #20170240851

Cleaning composition for semiconductor substrate and cleaning method

A cleaning composition for a semiconductor substrate contains a solvent, and a polymer that includes a fluorine atom, a silicon atom or a combination thereof. The content of water in the solvent is preferably no greater than 20% by mass. ... Jsr Corporation

08/17/17 / #20170233561

Crosslinked rubber, member for tires, vibration-proofing member, member for belts, and rubber composition

. . A cross-linked rubber exhibits high strength and excellent abrasion resistance as compared with a known cross-linked rubber. The cross-linked rubber is obtained by cross-linking a rubber composition that includes a hydrogenated conjugated diene-based polymer, an olefin-based rubber, and a cross-linking agent, the hydrogenated conjugated diene-based polymer being a hydrogenated product of a polymer that includes a structural unit derived from butadiene, and including at least one of an amino group and a hydrocarbyloxysilyl group at one terminal or each terminal.. ... Jsr Corporation

08/03/17 / #20170218229

Germanium smoothing and chemical mechanical planarization processes

Method for chemical mechanical planarization is provided, which includes: forming a dielectric layer containing at least one opening, the dielectric layer is located on a substrate; epitaxially growing a germanium material within the at least one opening of the dielectric layer, the germanium material extending above a topmost surface of the dielectric layer; and planarizing the germanium material using at least one slurry composition to form coplanar surfaces of the germanium material and the dielectric layer, where a slurry composition of at least one slurry composition polishes the germanium material selective to the topmost surface of the dielectric layer, and includes an abrasive, at least one ph modulator, and an oxidizer, the at least one ph modulator including an acidic ph modulator, and lacking a basic ph modulator.. . ... Jsr Corporation

07/27/17 / #20170211225

Sizing agent, composition, and formed article

A composition improves mechanical strength (e.g., impact resistance and flexural strength), and achieves improved mass productivity by reducing a situation in which a strand fuzzes during extrusion. The composition includes a conjugated diene-based polymer (a), fibers (b), and a thermoplastic resin (c), the composition including the conjugated diene-based polymer (a) in a ratio of 0.05 to 30 parts by mass based on 100 parts by mass of the thermoplastic resin (c), and including the fibers (b) in a ratio of 3 to 150 parts by mass based on 100 parts by mass of the thermoplastic resin (c), wherein the conjugated diene-based polymer (a) includes at least one functional group selected from the group consisting of an alkoxysilyl group and an amino group.. ... Jsr Corporation

07/20/17 / #20170204216

Block copolymer

A block copolymer includes a polystyrene block including a styrene unit, and a polyalkyl (meth)acrylate block including an alkyl (meth)acrylate unit. The block copolymer includes an organic group that is bound to at least one end of a main chain of the block copolymer and that comprises a hetero atom. ... Jsr Corporation

07/13/17 / #20170199453

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (a) containing repeating units represented by the general formulae (1) and (2) and having mw of 1,000-50,000, a resin (b) having an acid-unstable group, a radiation-sensitive acid generator (c), a nitrogen-containing compound (d) and a solvent (e).. ... Jsr Corporation

06/29/17 / #20170184960

Pattern-forming method

. . A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. ... Jsr Corporation

06/22/17 / #20170176878

Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate

A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. ... Jsr Corporation

06/01/17 / #20170154782

Composition for film formation, film, production method of patterned substrate, and compound

A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and x2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. ... Jsr Corporation

06/01/17 / #20170153543

Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern

The present invention provides a photosensitive resin composition including: an alkali-soluble resin (a) having more than 30% by mass and less than 70% by mass of a structural unit represented by the formula (1) below; a compound (b) having at least one ethylenically unsaturated double bond per molecule; and a photo radical polymerization initiator (c) having an oxime ester structure; wherein a content of the photo radical polymerization initiator (c) with respect to 100 parts by mass of the alkali-soluble resin (a) is 3 to 20 parts by mass. In formula (1), r1 represents a hydrogen atom or a c1-4 alkyl group. ... Jsr Corporation

05/11/17 / #20170131634

Chemically amplified resist material and resist pattern-forming method

. . A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid generating agent included in the generative component comprises a compound represented by the formula (b). ... Jsr Corporation

05/11/17 / #20170131633

Chemically amplified resist material and resist pattern-forming method

A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. ... Jsr Corporation

05/11/17 / #20170131632

Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method

An acid diffusion control agent includes a compound represented by a formula (1), a compound represented by a formula (2) or both thereof. R1 represents a hydrocarbon group comprising a monovalent alicyclic structure, or the like. ... Jsr Corporation

05/04/17 / #20170127533

Production process for solder electrode, production process for laminate, laminate and electronic part

A production process for a solder electrode, including: a step (i) of forming an opening in a portion of a film provided on a substrate having an electrode pad, the portion corresponding to the electrode pad on the substrate, and thereby forming a resist from the film on the substrate, and a step (ii) of filling the opening of the resist with molten solder, wherein the resist is composed of at least two layers each containing a resin as a constituent, and a layer (1) of the resist, the layer (1) being closest to the substrate, does not substantially contain a component that thermally crosslinks the resin contained as a constituent in the layer (1) and a component that undergoes thermal self-crosslinking.. . ... Jsr Corporation

04/27/17 / #20170115570

Resin composition, resist pattern-forming method and polymer

A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), r1 to r4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of r1 to r4 has the fluorine atom or a group including the fluorine atom. ... Jsr Corporation

04/20/17 / #20170110334

Germanium smoothing and chemical mechanical planarization processes

Method for chemical mechanical planarization is provided, which includes: forming a dielectric layer containing at least one opening, the dielectric layer is located on a substrate; epitaxially growing a germanium material within the at least one opening of the dielectric layer, the germanium material extending above a topmost surface of the dielectric layer; and planarizing the germanium material using at least one slurry composition to form coplanar surfaces of the germanium material and the dielectric layer, where a slurry composition of at least one slurry composition polishes the germanium material selective to the topmost surface of the dielectric layer, and includes an abrasive, at least one ph modulator, and an oxidizer, the at least one ph modulator including an acidic ph modulator, and lacking a basic ph modulator.. . ... Jsr Corporation

04/20/17 / #20170110333

Group iii arsenide material smoothing and chemical mechanical planarization processes

A chemical mechanical planarization for a group iii arsenide material is provided in which at least one opening is formed within a dielectric layer located on a substrate. A group iii arsenide material is epitaxially grown within the at least one opening of the dielectric layer which extends above a topmost surface of the dielectric layer. ... Jsr Corporation

04/20/17 / #20170110332

Indium phosphide smoothing and chemical mechanical planarization processes

A chemical mechanical planarization for indium phosphide material is provided in which at least one opening is formed within a dielectric layer located on a substrate. An indium phosphide material is epitaxially grown within the at least one opening of the dielectric layer which extends above a topmost surface of the dielectric layer. ... Jsr Corporation

03/16/17 / #20170075224

Resist pattern-forming method

. . A resist pattern-forming method comprises applying a chemically amplified resist material on a substrate to form a resist film on the substrate. The resist film is patternwise exposed to a radioactive ray having a wavelength of no greater than 250 nm. ... Jsr Corporation

03/16/17 / #20170075221

Chemically amplified resist material and resist pattern-forming method

A chemically amplified resist material comprises: a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The polymer component comprises: a first polymer comprising a first structural unit that comprises a fluorine atom and does not comprise a salt structure; or a second polymer comprising a second structural unit that comprises a fluorine atom and a salt structure. ... Jsr Corporation

03/16/17 / #20170073541

Composition for forming liquid immersion upper layer film, and polymer

An immersion upper layer film-forming composition includes [a] a polymer component that includes a polymer (a1), and [b] a solvent, the polymer (a1) including a structural unit (i) that includes a group represented by the following formula (i). The structural unit (i) is preferably a structural unit (i-1) represented by the following formula (1). ... Jsr Corporation

03/02/17 / #20170059992

Resist pattern-forming method and chemically amplified radiation-sensitive resin composition

. . A resist pattern-forming method comprises applying a chemically amplified radiation-sensitive resin composition on a substrate to form a resist film. The chemically amplified radiation-sensitive resin composition comprises a first component solubility in a developer solution of which is capable of being altered by an action of an acid, a second component that is capable of generating an acid by an action of a first exposure light comprising a radioactive ray having a first wavelength, and a sensitizer precursor to be converted into a sensitizer by an action of the first exposure light. ... Jsr Corporation

02/16/17 / #20170043320

Solid-phase carrier, production method for solid-phase carrier, carrier for affinity refining, production method for filler for affinity chromatography, filler for affinity chromatography, chromatography column, and refining method

There are provided a solid-phase carrier and a carrier for affinity refining that exhibit high dynamic binding capacity when a ligand is immobilized, have excellent antifouling properties, and are unlikely to have non-specific adsorption of impurities. The solid-phase carrier has a functional group capable of fixing a ligand and is characterized by having a group having a sulfinyl group, a sulfide group, an oxy group or an imino group, and a hydroxyl group, a thiol group, an amino group, a carboxy group, a sulfate group, a phosphate group or an alkanoyl group.. ... Jsr Corporation

02/09/17 / #20170042038

Process for producing substrate having wiring, radiation-sensitive composition, electronic circuit and electronic device

A process for producing a substrate having wiring includes steps (i) to (v) described as follows: (i) applying a radiation-sensitive composition on a substrate to form a coating film; (ii) irradiating a prescribed part of the coating film with radiation to allow the coating film to have a radiation-irradiated region and a radiation-unirradiated region; (iii) allowing the coating film obtained in the step (ii) to have a concave region and a convex region; (iv) forming wiring on the concave region; and (v) removing the convex region by an application of radiation or by heating.. . ... Jsr Corporation

02/09/17 / #20170038679

Radiation-sensitive resin composition, resist pattern-forming method, acid generator and compound

The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having so3−, wherein a hydrogen atom or an electron-donating group bonds to an α carbon atom with respect to so3−, and an electron-withdrawing group bonds to a β carbon atom with respect to so3−; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). ... Jsr Corporation

01/12/17 / #20170010270

Method for assaying soluble gpc3 protein

The present invention relates to a method for assaying soluble gpc3 protein in a test sample, comprising using two different antibodies binding to different epitopes present in the n-terminal region of gpc3 protein.. . ... Jsr Corporation

01/05/17 / #20170003595

Pattern-forming method, resin, and composition

. . A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution. Preferably, the pattern-forming method further comprises, after the forming of the silicon-containing film and before the removing of the resist underlayer film and the silicon-containing film, forming a resist pattern on an upper face side of the silicon-containing film, and etching the silicon-containing film using the resist pattern as a mask.. ... Jsr Corporation

01/05/17 / #20170003425

Optical filter, and solid-state image pickup device and camera module using the optical filter

The problem of the present invention is to overcome drawbacks of conventional optical filters such as near-infrared cut filters and to provide an optical filter which generates little scatted light even during light absorption and has excellent transmittance property. The optical filter of the present invention is characterized by containing a squarylium-based compound and a compound which absorbs or quenches fluorescence of the squarylium-based compound. ... Jsr Corporation

01/05/17 / #20170003417

Optical filter, and solid-state image pickup device and camera module using the optical filter

The problem of the present invention is to overcome drawbacks of conventional optical filters such as near-infrared cut filters and to provide an optical filter which generates little scatted light even during light absorption and has excellent transmittance property. The optical filter of the present invention is characterized by containing a squarylium-based compound and a compound which absorbs or quenches fluorescence of the squarylium-based compound. ... Jsr Corporation








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