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Kanto Kagaku Kabushiki Kaisha patents


Recent patent applications related to Kanto Kagaku Kabushiki Kaisha. Kanto Kagaku Kabushiki Kaisha is listed as an Agent/Assignee. Note: Kanto Kagaku Kabushiki Kaisha may have other listings under different names/spellings. We're not affiliated with Kanto Kagaku Kabushiki Kaisha, we're just tracking patents.

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Composition for removing photoresist residue and/or polymer residue

To provide a composition for removing photoresist residue and/or polymer residue formed in a process for producing a semiconductor circuit element, and a removal method employing same. A composition for removing photoresist residue and/or polymer residue, the composition containing saccharin and water, and the ph being no greater than 9.7.. ... Kanto Kagaku Kabushiki Kaisha

Method for manufacturing niobate-system ferroelectric thin-film device

This method for manufacturing a lead-free niobate-system ferroelectric thin film device includes: a lower electrode film formation step of forming a lower electrode film on a substrate; a ferroelectric thin film formation step of forming a niobate-system ferroelectric thin film on the lower electrode film; an etch mask pattern formation step of forming an etch mask in a desired pattern on the niobate-system ferroelectric thin film; and a ferroelectric thin film etching step of shaping the niobate-system ferroelectric thin film into a desired fine pattern by wet etching using an etchant comprising: a predetermined chelating agent including at least one selected from edtmp, ntmp, cydta, hedp, gbmp, dtpmp, and citric acid; an aqueous alkaline solution containing an aqueous ammonia solution; and an aqueous hydrogen peroxide solution.. . ... Kanto Kagaku Kabushiki Kaisha

Pentaarylbiimidazole compound and production method for said compound

. . In order to address the problems of conventional photochromic compounds, which are the insufficient coloring/discoloring speed and durability exhibited thereby and the large number of production steps, the present invention provides a photochromic compound that exhibits a high speed coloring/discoloring reaction and high durability while it is able to be synthesized in low cost, and that has industrial applicability. The compound of the present invention is characterized by the insertion of a diarylimidazolyl radical into the ortho position of an aryl group. ... Kanto Kagaku Kabushiki Kaisha








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