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Nova Measuring Instruments Ltd patents


Recent patent applications related to Nova Measuring Instruments Ltd. Nova Measuring Instruments Ltd is listed as an Agent/Assignee. Note: Nova Measuring Instruments Ltd may have other listings under different names/spellings. We're not affiliated with Nova Measuring Instruments Ltd, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "N" | Nova Measuring Instruments Ltd-related inventors


 new patent  Method for use in process control of manufacture of patterned sample

A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m<n; processing said intermediate measured data, determining at least a location parameter of a predetermined feature of the pattern, and generating measured data indicative of said at least one selected parameter; utilizing said at least location parameter of the predetermined feature for optimizing a data interpretation model for interpretation of measured data indicative of an optical response from the sample being patterned by k-th subsequent patterning stage, m<k≤n.. ... Nova Measuring Instruments Ltd

 new patent  Optical metrology for in-situ measurements

A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. ... Nova Measuring Instruments Ltd

Method and system for optimizing optical inspection of patterned structures

A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.. ... Nova Measuring Instruments Ltd

Optical phase measurement method and system

A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. ... Nova Measuring Instruments Ltd

Method and system for optical metrology in patterned structures

A data analysis method and system are presented for use in determining one or more parameters of a patterned structure located on top of an underneath layered structure. According to this technique, input data is provided which includes first measured data pmd being a function ƒ of spectral intensity iλ and phase φ, pmd=ƒ(iλ;φ), corresponding to a complex spectral response of the underneath layered structure, and second measured data smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure. ... Nova Measuring Instruments Ltd

Lateral shift measurement using an optical technique

Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. ... Nova Measuring Instruments Ltd

Test structure for use in metrology measurements of patterns

A test structure and method of its manufacture are presented for use in metrology measurements of a sample pattern. The test structure comprises a test pattern comprising a portion of the sample pattern including at least one selected feature and a blocking layer at least partially covering regions of the test structure adjacent to the at least one selected region. ... Nova Measuring Instruments Ltd

Metrology test structure design and measurement scheme for measuring in patterned structures

A test structure is presented for use in metrology measurements of a sample pattern. The test structure comprises a main pattern, and one or more auxiliary patterns. ... Nova Measuring Instruments Ltd

Process control using non-zero order diffraction

A method of controlling a manufacturing process, the method including the steps of a) providing a testing area with a periodic structure, where the periodic structure includes a series of sets of patterned features, b) illuminating the periodic structure with a light, thereby producing a non-zero order diffraction signal, c) collecting the diffraction signal to produce a test signature, d) matching the test signature with a reference signature, where the reference signature was previously produced by performing steps a), b), and c) with respect to a reference structure that is at least similar to the periodic structure, and e) controlling a manufacturing process using a control setting set associated with the matching reference signature.. . ... Nova Measuring Instruments Ltd

Optical metrology for in-situ measurements

A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. ... Nova Measuring Instruments Ltd

Optical method and system for defects detection in three-dimensional structures

An inspection system and method are presented for inspecting structures having a pattern formed by an array of elongated grooves having high aspect-ratio geometry, such as semiconductor wafers formed with vias. The inspection system comprises an imaging system and a control unit. ... Nova Measuring Instruments Ltd

Method and system for improving optical measurements on small targets

A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of point spread functions (psfs) of the illumination and collection channels, and determining data indicative of optional tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring composing at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels.. ... Nova Measuring Instruments Ltd

Overlay design optimization

A sample comprising an overlay target is presented. The overlay target comprises at least one pair of patterned structures, the patterned structures of the pair being accommodated in respectively bottom and top layers of the sample with a certain vertical distance h between them, wherein a pattern in at least one of the patterned structures has at least one pattern parameter optimized for a predetermined optical overlay measurement scheme with a predetermined wavelength range.. ... Nova Measuring Instruments Ltd

Test structures and metrology technique utilizing the test structures for measuring in patterned structures

An article is presented configured for controlling a multiple patterning process, such as a spacer self-aligned multiple patterning, to produce a target pattern. The article comprises a test site carrying a test structure comprising at least one pair of gratings, wherein first and second gratings of the pair are in the form of first and second patterns of alternating features and spaces and differ from the target pattern by respectively different first and second values which are selected to provide together a total difference such that a differential optical response from the test structure is indicative of a pitch walking effect.. ... Nova Measuring Instruments Ltd

01/19/17 / #20170018069

Hybrid metrology technique

A computerized system and method are provided for use in measuring at least one parameter of interest of a structure. The system comprises a server utility configured for data communication with at least first and second data provider utilities. ... Nova Measuring Instruments Ltd

01/19/17 / #20170016835

Optical phase measurement method and system

A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. ... Nova Measuring Instruments Ltd








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