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Oxford Instruments Nanotechnology Tools Limited patents


Recent patent applications related to Oxford Instruments Nanotechnology Tools Limited. Oxford Instruments Nanotechnology Tools Limited is listed as an Agent/Assignee. Note: Oxford Instruments Nanotechnology Tools Limited may have other listings under different names/spellings. We're not affiliated with Oxford Instruments Nanotechnology Tools Limited, we're just tracking patents.

ARCHIVE: New 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 | Company Directory "O" | Oxford Instruments Nanotechnology Tools Limited-related inventors


X-ray analysis in air

An x-ray analysis apparatus comprises an electron beam assembly for generating a focused electron beam within a first gas pressure environment. A sample assembly is used for retaining a sample within a second gas pressure environment such that the sample receives the electron beam from the electron beam assembly and such that the gas pressure in the second gas pressure environment is greater than the gas pressure within the first gas pressure environment. ... Oxford Instruments Nanotechnology Tools Limited

A method for measuring the mass thickness of a target sample for electron microscopy

A method is provided of measuring the mass thickness of a target sample for use in electron microscopy. Reference data are obtained which is representative of the x-rays (28) generated within a reference sample (12) when a particle beam (7) is caused to impinge upon a region (14) of the reference sample (12). ... Oxford Instruments Nanotechnology Tools Limited

Method of accelerating cool down

The present invention provides a method of accelerating cool down of a target member of a cryogenic system to a cryogenic operating temperature. The method comprises the steps of cooling a target region of a cryogenic system with a first cooling apparatus, the first cooling apparatus being adapted to cool the target region to a first temperature by thermal conduction between the first apparatus and the target member, and having a first cooling power at the first temperature; and cooling the target member of the cryogenic system from the first temperature to an operating temperature using a cryocooler, where the first cooling power of the first cooling apparatus at the first temperature is greater than the cooling power of the cryocooler at the first temperature. ... Oxford Instruments Nanotechnology Tools Limited

Cyclical plasma etching

There is provided an apparatus for cyclical plasma etching of a substrate, the apparatus comprising: a process chamber; a support within the process chamber for receiving the substrate to be etched; a controller for repeatedly applying a dosing step and a bombardment steps respectively; a dosing controller for controlling the flow of a process gas in the dosing step such that the substrate is exposed to a maximum dose of process gas in use of 1000 langmuirs and said dose is controllable within an accuracy of 1 langmuir; and a first signal generator coupled to the process chamber and a second signal generator coupled to the support within the process chamber, the first and second signal generators being configured such that in use positions ions of an plasma active species within the process chamber have a substrate bombardment energy in the range of 10 ev to 100 ev which is controllable within an accuracy of 5 ev. There is also provided a method for cyclical plasma etching of a substrate using said apparatus.. ... Oxford Instruments Nanotechnology Tools Limited








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